A method and a device for removing a photoresist film which can reduce ventilation equipment costs and material costs and prevent environmental pollutions; specifically, a method for removing a photoresist film in an airtight system by supplying to a photoresist film spread on a substrate surface a photoresist film removing agent, containing an ozonized gas and a photoresist film removing solution, from a photoresist film removing agent supply plate disposed facing the photoresist film uniformly and continuously or intermittently; and a photoresist film removing device used for the method.
