发明名称 MAIN ARM SYSTEM OF WAFER ABSORBING TYPE BY USING VACUUM
摘要 PURPOSE: A main arm system is provided to prevent a wafer from deviating and being broken caused by the weak point of a spinner equipment used for a semiconductor producing process. CONSTITUTION: A main arm(200) decides the existence of a wafer(50) by vacuum when a vacuum line(250) provided through a vacuum hole(270) in a main arm finger(220) sets the wafer. The wafer moves to the next process when the wafer is normally set and then the wafer moves the other process by intercepting vacuum. Herein the system stops when the setting state of the wafer is bad like the wafer jumps on the main arm finger. Therefore, the wafer is prevented from being broken.
申请公布号 KR20000028303(A) 申请公布日期 2000.05.25
申请号 KR19980046483 申请日期 1998.10.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, HUI YEOL;CHOI, SEON JIP
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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