发明名称 GAS EXHAUST APPARATUS USED FOR SEMICONDUCTOR FABRICATING EQUIPMENT
摘要 PURPOSE: A gas exhaust apparatus is provided to prevent exhaust gas from being accumulated in an equipment as temperature falls. CONSTITUTION: A gas exhaust pipe(210) has a gas inlet(221) connected with a gas exhaust pipe(210) and a gas outlet(222) connected with a flexible tube(230). Chemical source gas is injected into an inner tube(30) through a gas inlet hole(61) placed on the side of a flange(60) for being diffused on the surface of a wafer(10), which is accumulated on a quartz boat(20). The rest residual gas is exhausted through a gas outlet port(62) to flow into the gas exhaust pipe and a pump(220). The flexible tube functions as a pipe for passing the gas discharged from the pump while connecting its end portion with the gas outlet of the pump and the other end portion with an inlet(241) of a silencer(240). An adiabatic layer(231) in the flexible tube is coated to prevent the exhaust gas from losing heat. Therefore, the gas exhaust pipe prevents the ammonium chloride generated in the process of forming a nitride film from being accumulated in the flexible tube.
申请公布号 KR20000028109(A) 申请公布日期 2000.05.25
申请号 KR19980046246 申请日期 1998.10.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KYEONG UN;HEO, NAM SEONG;HAN, JONG HYEON
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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