发明名称 |
Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion |
摘要 |
A system and method for forming a plurality of structures in a low dielectric constant layer is disclosed. The low dielectric constant layer is disposed on a semiconductor. The method and system include exposing the low dielectric constant layer to an agent that improves adhesion of a photoresist, providing a layer of the photoresist on the low dielectric constant layer, patterning the photoresist, and etching the low dielectric constant layer to form the plurality of structures.
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申请公布号 |
US6066578(A) |
申请公布日期 |
2000.05.23 |
申请号 |
US19970980888 |
申请日期 |
1997.12.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GUPTA, SUBHASH;SINGH, BHANWAR;MORALES, CARMEN |
分类号 |
G03F7/16;H01L21/027;H01L21/311;H01L21/312;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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