发明名称 |
Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section |
摘要 |
A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.
|
申请公布号 |
US6066210(A) |
申请公布日期 |
2000.05.23 |
申请号 |
US19960692461 |
申请日期 |
1996.08.05 |
申请人 |
KOKUSAI ELECTRIC CO., LTD. |
发明人 |
YONEMITSU, SHUJI;KARINO, TOSHIKAZU;YOSHIDA, HISASHI;WATAHIKI, SHINICHIRO;YOSHIDA, YUJI;SHIMURA, HIDEO;SUGIMOTO, TAKESHI;ABURATANI, YUKINORI;IKEDA, KAZUHITO |
分类号 |
B65G49/07;H01L21/00;H01L21/677;(IPC1-7):C23C16/00 |
主分类号 |
B65G49/07 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|