发明名称 |
High temperature resistive heater for a process chamber |
摘要 |
A resistive heating structure for a processing apparatus such as a chemical vapor deposition chamber. The system includes a resistive heating substrate holder including a support surface and a support shaft, the holder being comprised of a first material. The support surface includes a resistive heating element. The support shaft has a given length, and through bores for allowing a thermocouple to engage the support surface and electrical conductors to couple to the resistive heating element in the support surface. A metallic mounting structure is coupled to the support shaft and secured to the process apparatus to create a sealed environment within the holder and mounting structure to protect the electrical leads and thermocouple from the process environment.
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申请公布号 |
US6066836(A) |
申请公布日期 |
2000.05.23 |
申请号 |
US19960717780 |
申请日期 |
1996.09.23 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHEN, STEVEN AIHUA;HO, HENRY;CHANG, MEI;XI, MING;CHEN, CHEN-AN;CHEN, CHILIANG |
分类号 |
C23C16/46;F27D99/00;(IPC1-7):F27B5/14;C23C16/00 |
主分类号 |
C23C16/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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