发明名称 METHOD AND DEVICE FOR FILM FORMATION
摘要 PROBLEM TO BE SOLVED: To provide a thick film which has a film thickness enough to give a shock resistance and is excellent in the smoothness of the film surface, a method for forming a colored thick film, and a device therefor. SOLUTION: This film formation method involves an adhesion process where a coating liquid to be a coating film is sprayed on the surface 12a of a substrate 12, on which the coating film is formed, to be stuck to the surface, and a film formation process where the substrate 12 is axially rotated around the almost central part of the surface to form the coating film comprising the coating liquid. When the coating film is formed by a spray method, the atomization pressure of the coating liquid is preferably set to 1.5-5 kg/cm2, the discharge rate of the coating liquid is desirably to 3-10 cc/min, and the distance from the discharge part, for example, a tip end of a spray nozzle, of the coating liquid to the surface of the film formation is preferably set to 30-100 mm.
申请公布号 JP2000140745(A) 申请公布日期 2000.05.23
申请号 JP19980314219 申请日期 1998.11.05
申请人 NIKON CORP 发明人 TADANO FUMIO;ONO ICHIROU
分类号 B05B15/00;B05C11/08;B05D1/40;B05D5/00;(IPC1-7):B05D1/40 主分类号 B05B15/00
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