发明名称 PRODUCTION OF COMPOUND SEMICONDUCTOR SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for stably producing a continuous compound semiconductor single crystal in high reproducibility with low power consumption. SOLUTION: This method for producing a compound semiconductor single crystal has such advantages that, since the crystal pull-up space A disposed with a PBN crucible 31 inside a high-pressure vessel 16 as an oven and the heating space B disposed with a heater 7 are partitioned from each other with space-partitioning jigs 8, 9, 17 as walls, the amount of a feedstock to be charged can be increased without increasing the amount of the gas to be encapsulated inside the vessel; furthermore, heat can be moderately allowed to escape from crystal surface, therefore increasing no electric power to be charged into the heater 7 during crystal growth; as a result, the aimed continuous compound semiconductor single crystal can be produced stably and in high reproducibility; besides, when a crystal growth is to be conducted by encapsulating the crystal pull-up space A with a gas higher in thermal conductivity than the heating space B, heat is released from crystal surface more efficiently.
申请公布号 JP2000143387(A) 申请公布日期 2000.05.23
申请号 JP19980317871 申请日期 1998.11.09
申请人 HITACHI CABLE LTD 发明人 SUZUKI TAKASHI
分类号 H01L21/208;C30B15/14;C30B27/02;C30B29/42;(IPC1-7):C30B15/14 主分类号 H01L21/208
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