发明名称 |
Puncture resistant, high shrinkfilms, blends, and process |
摘要 |
A polymer blend and mono-and multilayer films made therefrom having an improved combination of properties such as high shrinkage values and high puncture resistance wherein the blend has a first copolymer of ethylene and octene-1 having a copolymer melting point of from 55 to 95 DEG C, preferably of from 80 to 92 DEG C; a second copolymer of ethylene and at least one alpha -olefin having a copolymer melting point of from 115 to 128 DEG C: and a third copolymer of ethylene and a vinyl ester or alkyl acrylate and having a melting point of from 60 to 110 DEG C, and a process for making such films, which preferably have at least 45% shrinkage at 90 DEG C in at least one direction. <IMAGE> |
申请公布号 |
AU5942599(A) |
申请公布日期 |
2000.05.18 |
申请号 |
AU19990059425 |
申请日期 |
1999.11.15 |
申请人 |
VISKASE CORPORATION |
发明人 |
PAUL DAVID TATARKA;PAUL NICK GEORGELOS;SCOTT ALLAN IDLAS |
分类号 |
B29C55/28;B32B7/02;B32B27/32;C08J5/18;C08L23/08 |
主分类号 |
B29C55/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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