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发明名称
Positivarbeitendes strahlenempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
摘要
申请公布号
DE59604943(D1)
申请公布日期
2000.05.18
申请号
DE19965004943
申请日期
1996.09.03
申请人
BASF AG
发明人
SCHWALM, DR.;FUNHOFF, DR.;BINDER, HORST
分类号
G03F7/004;G03F7/039;(IPC1-7):G03F7/004
主分类号
G03F7/004
代理机构
代理人
主权项
地址
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