| 摘要 |
<p>This invention relates to a process for generating an organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendent COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of an acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.</p> |
