发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 A radiation-sensitive resin composition containing an alkali-soluble resin, such as the positive quinonediazide-novolak type or the negative chemical amplification type, wherein the alkali-soluble resin is one obtained by condensation-polymerizing a compound represented by general formula (I) optionally together with a phenol with an aldehyde compound; wherein R represents hydroxy or C1-4 alkyl and n is an integer of 0 to 3, provided that when n is 2 or 3, then R's may be the same or different.
申请公布号 WO0028383(A1) 申请公布日期 2000.05.18
申请号 WO1999JP06074 申请日期 1999.11.01
申请人 CLARIANT INTERNATIONAL LTD.;KOBAYASHI, SATOSHI;SHIODA, HIDEKAZU;ITOH, HARUHIKO 发明人 KOBAYASHI, SATOSHI;SHIODA, HIDEKAZU;ITOH, HARUHIKO
分类号 H01L21/027;C08F2/46;G03F7/004;G03F7/023;G03F7/032;G03F7/038;(IPC1-7):G03F7/023;G03F7/039;C08L61/34;C08G14/073 主分类号 H01L21/027
代理机构 代理人
主权项
地址