发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
A radiation-sensitive resin composition containing an alkali-soluble resin, such as the positive quinonediazide-novolak type or the negative chemical amplification type, wherein the alkali-soluble resin is one obtained by condensation-polymerizing a compound represented by general formula (I) optionally together with a phenol with an aldehyde compound; wherein R represents hydroxy or C1-4 alkyl and n is an integer of 0 to 3, provided that when n is 2 or 3, then R's may be the same or different.
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申请公布号 |
WO0028383(A1) |
申请公布日期 |
2000.05.18 |
申请号 |
WO1999JP06074 |
申请日期 |
1999.11.01 |
申请人 |
CLARIANT INTERNATIONAL LTD.;KOBAYASHI, SATOSHI;SHIODA, HIDEKAZU;ITOH, HARUHIKO |
发明人 |
KOBAYASHI, SATOSHI;SHIODA, HIDEKAZU;ITOH, HARUHIKO |
分类号 |
H01L21/027;C08F2/46;G03F7/004;G03F7/023;G03F7/032;G03F7/038;(IPC1-7):G03F7/023;G03F7/039;C08L61/34;C08G14/073 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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