| 摘要 |
The present invention provides in one embodiment thereof an integrated circuit (IC). The IC includes a silicon substrate and a dielectric layer formed upon the silicon substrate. The IC further includes a terminal metal layer (TML) formed upon the dielectric layer. The dielectric layer and the TML form a die active area. The IC also includes a first guard ring formed out of the TML. The first guard encloses the die active area. Furthermore the IC includes a second guard ring formed out of the TML. The second guard ring encloses the first guard ring. |
