| 发明名称 |
Durable optical system for projection exposure apparatus and method of manufacturing the same |
| 摘要 |
<p>An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm. <IMAGE> <IMAGE></p> |
| 申请公布号 |
EP1001314(A2) |
申请公布日期 |
2000.05.17 |
| 申请号 |
EP19990121982 |
申请日期 |
1999.11.10 |
| 申请人 |
NIKON CORPORATION |
发明人 |
JINBO, HIROKI;FUJIWARA, SEISHI |
| 分类号 |
H01L21/027;C03B8/04;C03B20/00;C03C3/06;G02B13/14;G02B19/00;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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