发明名称 |
Temperature controlled liner |
摘要 |
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.
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申请公布号 |
US6063199(A) |
申请公布日期 |
2000.05.16 |
申请号 |
US19980052742 |
申请日期 |
1998.03.31 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SAJOTO, TALEX;SELYUTIN, LEONID;KU, VINCENT;ZHAO, JUN;DORNFEST, CHARLES |
分类号 |
C23C16/52;C23C16/44;C23C16/448;C23C16/455;H01L21/00;H01L21/31;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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