| 摘要 |
PROBLEM TO BE SOLVED: To obtain excellent pattern profile and to prevent the pattern from falling by laminating a specified positive photoresist compsn. on a specified substrate. SOLUTION: The laminated body is produced by applying a positive resist compsn. containing an alkali-soluble resin and a photosensitive agent on a substrate having a metal or ceramic surface and having steps of >=2.5 μm height. The alkali-soluble resin contains a novolac resin, and the photosensitive agent is a quinonediazide sulfonate of a phenol compd. In the fast liquid chromatography of the photosensitive material measured with a detector using UV rays at 254 nm wavelength, the pattern area of quinonediazide sulfonates of tervalent or higher valent phenol compds. is >=35% of the whole pattern area. By this method, an excellent pattern profile can be obtd., and pattern falling can be prevented. |
