发明名称 PATTERN INSPECTION METHOD AND ITS DEVICE
摘要 PROBLEM TO BE SOLVED: To improve defect detection sensitivity without being influenced by a false defect, and to easily inspect a defect where the matching between patterns having a complex shape lacks in a short time. SOLUTION: A pattern is actually picked up from an inspection sample by a first light receiving element 14B to calculate the barycentric coordinates of the pattern picked up by the first light receiving element, and a pattern is actually picked up from the inspection sample by a second light receiving element 14A to calculate the barycentric coordinates of the pattern picked up by the second light receiving element. Subsequently, the barycentric coordinates of the pattern picked up by the first light receiving element is compared with those of the pattern picked up by the second light receiving element to detect a pattern defect. Therefore, the defect detection sensitivity can be improved without being influenced by a false defect, and the defect inspection by the distance between patterns having a complex shape can be easily carried out in a short time.
申请公布号 JP2000137003(A) 申请公布日期 2000.05.16
申请号 JP19980311248 申请日期 1998.10.30
申请人 FUJITSU LTD 发明人 MATSUYAMA TAKAYOSHI;KOBAYASHI KENICHI
分类号 H01L21/66;G01N21/88;G01N21/93;G01N21/956;(IPC1-7):G01N21/88 主分类号 H01L21/66
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