| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition capable of being developed with high accuracy even with a dilute weak basic aqueous solution and able to form a hardened coating film having excellent water resistance or the like by compounding a specific pair of resins at least one of which has carboxy groups and a photo-acid generator. SOLUTION: This composition is obtained by compounding (A) a phenolic resin, (B) an epoxy resin and (C) a photo-acid generator when the component A and/or the component B contains COOH groups. For example, a COOH- containing novolak-type phenolic resin is preferably used as at least a part of the component A. Further as a COOH-containing component B, the following material or the like is preferably used, that is, a product prepared by adding an acid anhydride to a modified epoxy resin obtained by reacting an epoxy resin having two or more epoxy groups in a molecule with a compound having one or more functional groups capable of reacting with an epoxy group, and one or more alcoholic OH groups. |
