发明名称 |
Manufacture of a silicon waveguide structure |
摘要 |
A process for making a silicon rib wavegide structure is described comporising the following steps: (i) forming a window in a protective layer on the surface of a silicon wafer to expose a part of said surface; (ii) depositing a buffer layer at least over said exposed surface; (iii) carrying out an etch step to etch the buffer layer and silicon outside a protected rib portion thereby to form a silicon rib with the buffer layer on its upper surface; and (iv) forming a layer of cladding at least on side walls of the silicon rib.
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申请公布号 |
US6063299(A) |
申请公布日期 |
2000.05.16 |
申请号 |
US19990229424 |
申请日期 |
1999.01.13 |
申请人 |
BOOKHAM TECHNOLOGY LIMITED |
发明人 |
DRAKE, JOHN PAUL;SHAW, MATTHEW PETER |
分类号 |
G02B6/13;G02B6/122;G02B6/126;G02B6/136;G02F1/025;(IPC1-7):B44C1/22;H01L21/00 |
主分类号 |
G02B6/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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