发明名称 Method and apparatus to image metallic patches embedded in a non-metal surface
摘要 Small metallic patches embedded in a mainly non-metallic surface may be detected and mapped by placing a wire coil at the free end of a cantilever, with a fine tip made of a ferro-magnetic material located at its center. An alternating current is passed through the coil so that when it is near a metallic patch eddy currents are induced in the patch. These produce a small magnetic moment in the patch which pulls the tip towards the surface. This movement of the tip is detected by observing a light beam that is reflected off the surface of the cantilever. By plotting the output of a photodetector, sensistive to small changes in the reflected beam's position, as a function of the tip's location over the surface, a map of the metallic patches is produced.
申请公布号 US6064201(A) 申请公布日期 2000.05.16
申请号 US19980114125 申请日期 1998.07.13
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD.;NATIONAL UNIVERSITY OF SINGAPORE 发明人 CHA, CHER LIANG RANDALL;GONG, HAO;CHOR, ENG FONG;CHAN, LAP
分类号 G01R33/038;(IPC1-7):G01N27/90;G01R33/00;G01R33/12;G01R31/00;G01V3/00 主分类号 G01R33/038
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