发明名称 ELECTROSTATIC DEFLECTING SYSTEM FOR ELECTRON BEAM IRRADIATING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce displacement of a deflecting position to improve accuracy by forming a metal thin film made of platinum by fixing a plurality of electrodes to a holding member and then depositing them on the inner wall surfaces of the plurality of electrodes. SOLUTION: A platinum wire 41, depositing material, is inserted into a central shaft of an electrostatic deflecting system 10, the lower part of the wire 41 is mounted to a Z-stage 42 that is a vertically moving mechanism, and the upper part is mounted to a Z-stage 43. The assembled electrostatic deflecting system 10 is held on a rotation table 27 in a state that an upper plate 24 and a rotation restricting member 29 are removed, then the rotation restricting member 29 is mounted, the wire 41 is inserted into the electrostatic deflecting system 10 to be mounted to the Z-stages 42, 43. The rotation table 27 is rotated to rotate the electrostatic deflecting system 10, simultaneously the wire 41 is heated by current flow and vertically moved, and the platinum evaporated from the wire 41 is deposited on the inner wall surfaces of electrode materials to form a thin film. Thus, even if the inner wall surfaces of the electrode materials are dirty, the inner wall surfaces do not charge up.
申请公布号 JP2000138036(A) 申请公布日期 2000.05.16
申请号 JP19980311945 申请日期 1998.11.02
申请人 ADVANTEST CORP 发明人 DAIKYO YOSHIHISA;TANAKA HITOSHI;HARAGUCHI TAKESHI;ASHIHARA KAZUTO
分类号 H01J9/14;G03F7/20;H01J37/147;H01L21/027;(IPC1-7):H01J37/147 主分类号 H01J9/14
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