| 摘要 |
PROBLEM TO BE SOLVED: To obtain a heat-developable photosensitive material superior in film strength and stability against time lapse and high in contrast during storage for a long period by adding an epoxy compound and an acid anhydride to a composition of an organic silver salt and a photosensitive silver halide grains and a reducing agent to form the heat-developable photosensitive material on a support. SOLUTION: The heat-developable photosensitive material is formed on the support by adding the epoxy compound and the acid anhydride to the composition containing the organic silver salt and the photosensitive silver halide grains and the reducing agent. The epoxy compound is represented by formula I and the acid anhydride is represented by formula II, and in formulae I and II, R is a divalent bonding group of an optionally substituted alkylene; X is a divalent bonding group; and Z is an atomic group necessary to form a monocyclic or polycyclic group. This material may contain a hydrazine derivative. It is superior in the film strength and low in fog even in the case of storing it in a thermostat and superior in high contrast performance by adding the hydrazine derivative to it.
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