发明名称 |
Spacer formation for graded dopant profile having a triangular geometry |
摘要 |
The formation of a spacer for a graded dopant profile having a triangular geometry is disclosed. In one embodiment, a method has three steps. In the first step, a gate is formed on a substrate, the gate having two edges. In the second step, at least one spacer is formed, where each spacer is adjacent to an edge of the gate and has a triangular geometry. In the third step, an ion implantation is applied to form a graded lightly doped region within the substrate underneath each spacer, the region corresponding to the triangular geometry of the spacer.
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申请公布号 |
US6063679(A) |
申请公布日期 |
2000.05.16 |
申请号 |
US19970987558 |
申请日期 |
1997.12.09 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GARDNER, MARK I.;HAUSE, FRED N.;MAY, CHARLES E. |
分类号 |
H01L21/266;H01L21/336;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/266 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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