发明名称 VACUUM ABSORPTION SYSTEM OF MAIN ARM FOR SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE: A vacuum absorption system of a main arm for a semiconductor manufacturing apparatus is designed to stably convey a wafer by providing a device for vacuum-fixing the wafer on the main arm for conveying the wafer between units for each semiconductor manufacturing process. CONSTITUTION: A vacuum absorption system is provided with a vacuum hole formed on a wafer stacking location of a main arm(16). The vacuum hole is connected to a vacuum pump through a solenoid valve(172). The solenoid valve(172) is designed to cooperate with the operation of the main arm(16) so that the wafer can be fixed on the correct position using vacuum. The main arm includes a ring-shaped fingers and a plurality of pincettes(164) inserted into the ring-shaped fingers. The vacuum hole is formed one of the pincettes(164), which is located in a direction where the main arm(16) is returned after receiving the wafer.
申请公布号 KR20000026642(A) 申请公布日期 2000.05.15
申请号 KR19980044269 申请日期 1998.10.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JUNG SEOK;LEE, JE CHEOL;LEE, JUNG HUN;MUN, YOUN JUNG
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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