发明名称 |
METHOD FOR MANUFACTURING CAPACITOR USING SUPPLEMENTARY LAYER |
摘要 |
PURPOSE: A method for manufacturing a capacitor using a supplementary layer is provided to prevent a non-standard crystallization of a PZT(Pb(Zr,Ti)O3) layer by using a supplementary layer. CONSTITUTION: A method for manufacturing a capacitor using a supplementary layer comprises the steps of: forming an interlayer dielectrics(42) on a substrate(40); forming a contact hole(44) on the interlayer dielectrics; filling a conductive plug to the contact hole; forming a first conductive layer(48) on the interlayer dielectrics comprising the conductive plug; forming a first dielectric layer(50) on the first conductive layer; forming a second dielectric layer as a supplementary layer(52) on the first dielectric layer; and forming a second conductive layer(54) on the second dielectric layer.
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申请公布号 |
KR20000026362(A) |
申请公布日期 |
2000.05.15 |
申请号 |
KR19980043870 |
申请日期 |
1998.10.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, HAK JU |
分类号 |
H01L27/10;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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