发明名称 METHOD FOR MANUFACTURING CAPACITOR USING SUPPLEMENTARY LAYER
摘要 PURPOSE: A method for manufacturing a capacitor using a supplementary layer is provided to prevent a non-standard crystallization of a PZT(Pb(Zr,Ti)O3) layer by using a supplementary layer. CONSTITUTION: A method for manufacturing a capacitor using a supplementary layer comprises the steps of: forming an interlayer dielectrics(42) on a substrate(40); forming a contact hole(44) on the interlayer dielectrics; filling a conductive plug to the contact hole; forming a first conductive layer(48) on the interlayer dielectrics comprising the conductive plug; forming a first dielectric layer(50) on the first conductive layer; forming a second dielectric layer as a supplementary layer(52) on the first dielectric layer; and forming a second conductive layer(54) on the second dielectric layer.
申请公布号 KR20000026362(A) 申请公布日期 2000.05.15
申请号 KR19980043870 申请日期 1998.10.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, HAK JU
分类号 H01L27/10;(IPC1-7):H01L27/10 主分类号 H01L27/10
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