METHOD OF MANUFACTURING PATTERN OF SEMICONDUCTOR DEVICE USING PHOTOSENSITIVE MATERIAL

摘要

PURPOSE: A method of manufacturing a pattern of a semiconductor device using photosensitive material is provided to simplify the manufacturing process with a low cost. CONSTITUTION: A method of manufacturing a pattern of a semiconductor device using photosensitive material comprises the steps of: forming a photosensitive layer including photosensitive material on a semiconductor substrate; irradiating light source to a part of the photosensitive layer; eliminating the light-irradiated part of the photosensitive layer by a developing process and forming a pattern manufacturing part by the remained photosensitive layer; and eliminating the photosensitive material included in the pattern manufacturing part.