发明名称 THE METHOD FOR THIN COATING OF COMPOSITE
摘要 PURPOSE: A manufacturing method for thin film of metal compound is provided, which can manufacture thin film of metal compound stably and economically by controlling the composition rate of thin film by using reflection degree. The thin film of metal compound is used as a lustered watch case and chain, rim of glasses and rings. CONSTITUTION: The system comprises a vacuum room(1) that has an evaporation source(2), a shutter(3), an ion beam source(4) at the side bottom, a laser(12) at the opposite side of an ion beam source(4), a substrate(5), a substrate heater(7) at the top center, and a light detector(13) set just above the ion beam source(4) for detecting laser. The method is characterized by: (i) irradiate ion beam of the same gas as the atmospheric gas to the substrate(7) for forming thin film of metal compound on the substrate; (ii) evaporate metal by the evaporation source(2) in a gas atmosphere; and (iii) carrying out the control of the composition of thin film of metal by changing the amount of the atmosphere gas, the evaporation amount of metal, and reaching rate of energy and ion of ion gas, thereby changing the composition rate of thin film of metal compound and by computing the co-relation of composition rate and reflection degree.
申请公布号 KR100256354(B1) 申请公布日期 2000.05.15
申请号 KR19970072387 申请日期 1997.12.23
申请人 POHANG RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY;POSCO GROUP RESEARCH ASSOCIATION 发明人 PARK, HYUNG KUK;JUNG, JAE IN
分类号 C23C14/28;(IPC1-7):C23C14/28 主分类号 C23C14/28
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