发明名称 METHOD FOR FORMING POLYSILICON THIN FILM TRANSISTOR OF LCD
摘要 PURPOSE: A polysilicon TFT(thin film transistor) formation method of LCD(liquid crystal display) is provided to improve a mobility of electric field by forming tapered side walls of source and drain electrodes. CONSTITUTION: A source and a drain electrodes(12,13) spaced apart from each other are formed on an insulating substrate(10) so as to have tapered side walls by taper etching the source and the drain electrodes. An amorphous silicon layer(14) and insulating patterns(15a,15b) are formed. The exposed amorphous silicon layer(14) is implanted and then transferred to a polysilicon layer(14a) by laser annealing. A gate electrode(16) is formed on the insulating patterns(15a,15b). The spaced distance between the source and the drain electrodes(12,13) is positive number times of the laser beam wavelength.
申请公布号 KR20000027514(A) 申请公布日期 2000.05.15
申请号 KR19980045459 申请日期 1998.10.28
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 LEE, KYUNG HA;HWANG, JEONG TAE
分类号 H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L29/786
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