| 摘要 |
PURPOSE: A self locking contact plug manufacture method is provided to reduce a contact resistance generated in a contact hole and to prevent a separation phenomenon between a contact hole and a tungsten plug by forming oblique projections on the side-edges of the bottom of the contact hole. CONSTITUTION: A plurality of convex and concave are formed on side walls of third interlayer dielectrics(30,32,34,36) by etching the third interlayer dielectrics(30,32,34,36), a second interlayer dielectric(16) and a first interlayer dielectric(14) sequentially. An oblique projections are formed between the second(16) and first interlayer dielectric(14) in the contact hole by using an etching selectivity between the first interlayer dielectric(14) and the second interlayer dielectric(16).
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