METHOD FOR EVALUATING A GATE SIZE OF A SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method is provided to reduce the consumption of time and man power for evaluating a gate size by measuring the gate size with ease through a grasp of a gate position to be measured. CONSTITUTION: An evaluation-purposed gate is formed under the consideration of an arrangement environment for each device formation area to have on a peripheral region of a device formation region of a semiconductor wafer. A measurement of the formed evaluation-purposed gate size is measured to calculate a difference of the evaluation -purposed size and a designed gate size. The size difference between the actually manufactured evaluation-purposed gate and the designed gate. The evaluation gate is formed together with a gate formed on the device formation region at the same time.