Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same

摘要

A polymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition comprising the copolymer and a photoacid generator. The hydroxy group introduced into the polymer gives a great contribution to the adhesiveness of the composition to substrate and allows the composition to be applied to any substrate. In addition, the photoresist composition is superior in resolution, thermal resistance, etch resistance, and post-exposure storage stability and can be developed without changing the concentration of developing solution.