| 摘要 |
PURPOSE: A thin-film micromirror array-actuated(TMA) manufacturing method planarizes the surface of the second sacrificial layer in a low temperature, thereby improving the level parameter, minimizing the thermal damage of an actuator and an active matrix and preventing the damage of the active matrix, an active layer and a mirror during the removing process of the first sacrificial layer and the second sacrificial layer. CONSTITUTION: After the first sacrificial layer(155) is formed on the whole surface of an active matrix(100), an actuator(210) including a supporting layer(165), a bottom electrode(170), an active layer(175) and a top electrode(180) is formed on the first sacrificial layer(155). The second sacrificial layer(215) for facilitating the lamination of a metal layer to form a mirror and a post(220) is formed on the actuator(210). The second sacrificial layer(215) is so sufficiently laminated with a photo resist(PR), a spin on glass(SOG) or a spin on polymer(SOP) as to cover perfectly the top electrode(180) by a spin coating method. In this case, the surface of the second sacrificial layer(215) is planarized in a low temperature without the planarization process. The mirror is formed on the second sacrificial layer(215), then the second sacrificial layer(215) is removed by using an oxygen plasma and the first sacrificial layer(155) is removed by using a bromine fluoride or a xenon fluorine.
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