发明名称 METHOD OF MANUFACTURING MARK FOR MEASURING OVERLAY ACCURACY
摘要 PURPOSE: A method of forming a measurement mark is to form a measurement box comprised of a dual layer which has an inner layer and an outer layer, thereby improving overlay accuracy of a pattern. CONSTITUTION: The method comprises a step of forming a dual layer in a measurement box. The measurement box has an upper layer and a lower layer. The upper layer comprises an inner layer(1') and an outer layer(1"). The lower layer also comprises an inner layer(2') and an outer layer(2"). In the upper layer, the outer layer is formed around the inner layer with a predetermined distance. In the lower layer, the outer layer is also formed around the inner layer with a predetermined distance. The distance between the inner layer and the outer layer is desirably as short as possible. Since the distance is closely formed, when light is irradiated to the dual layer, an electric signal is clearly displayed on a monitor.
申请公布号 KR100256265(B1) 申请公布日期 2000.05.15
申请号 KR19930008674 申请日期 1993.05.20
申请人 HYUNDAI ELECTRONICS IND. CO.,LTD. 发明人 IM, JAE NAM
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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