GAS SUPPLIER OF DEPOSITION DEVICE FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A gas supplier of a deposition device supplies the backside of a wafer with heated gas so that the rate of deposition uniformity of a wafer is advanced. CONSTITUTION: When gas for processing is supplied in the processing chamber(30), heated gas within the range of temperature inside the processing chamber(30) is supplied to the back of the wafer(40) from the gas injection hole(32a). During the process for deposition, temperature controller(52) supplies a thermal wire(48) with current and the heat is sensed by temperature sensor(50).