THERMOCHROMIC BODY AND ITS PRODUCTION

摘要

PROBLEM TO BE SOLVED: To provide a thermo-chromic body having substrate film of a transition metal for forming vanadium dioxide film in a broad range of an oxygen gas flow rate ratio and its preparation method. SOLUTION: Substrate film of a transition metal is formed on a quartz glass substrate by sputtering with a high frequency sputtering device and vanadium dioxide film is formed on the substrate film by reactive sputtering. The sputtering condition is pref. to be a sputtering pressure of 0.5-2 Pa, rf electric power of 100 W, a substrate temp. of 360-400 deg.C, and the reactive sputtering condition is pref. to be an oxygen gas flow rate ratio of in a range of 1.2-10% in addition to the above described sputtering condition.