发明名称
摘要 A negative-working radiation-sensitive composition containing a) a compound which forms a strong acid on exposure to actinic radiation, b) a compound containing at least two acid-crosslinkable groups, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions is characterised in that the compound (a) is a di- or tri- or tetrahydroxybenzene which is esterified with 2, 3 or 4 sulphonic acids of the general formula R-SO3H and which is optionally also substituted by a radical R', where R and R' have identical or different meanings and R is an optionally further substituted (C1-C10)alkyl, (C5-C10)cycloalkyl, (C6-C10)aryl, (C6-C10)aryl(C1-C10)alkyl or (C3-C9)heteroaryl radical, and R' is one of the radicals mentioned for R, or a (C1-C10)alkanoyl, (C1-C16)alkoxycarbonyl or a (C7-C11)aroyl radical. The novel radiation-sensitive composition is remarkable for a high resolution and a high sensitivity over a wide spectral range. It also has a high thermal stability and does not form any corrosive photolysis products on exposure to light. The invention furthermore relates to a radiation-sensitive recording material which is produced therefrom and which is suitable for producing photoresists, electronic components or printed circuit boards, or for chemical milling.
申请公布号 JP3040593(B2) 申请公布日期 2000.05.15
申请号 JP19920124074 申请日期 1992.04.17
申请人 发明人
分类号 G03F7/00;C07C303/28;C07C309/65;C07C309/66;C07C309/73;G03F7/004;G03F7/028;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 主分类号 G03F7/00
代理机构 代理人
主权项
地址