发明名称 TRENCH CONTACT STRUCTURE BODY OF SEMICONDUCTOR DEVICE
摘要 PURPOSE: A trench contact structure body is provided to carry out more efficient and integrated trench device isolation by using a semiconductor substrate as a region in which a Vcc node, a Vss node, or an interconnection node is formed. CONSTITUTION: A device isolation trench(200) is formed on a semiconductor substrate(100).The trench is filled with an insulation layer(300) and the insulation layer(300) has a contact hole(600) exposing the semiconductor substrate(100) forming a trench bottom. The contact hole(600) is filled with the conductive layer(300) and the conductive layer(300) is connected to the semiconductor substrate(100) forming the trench bottom. The conductive layer(300) uses any one selected from a group having a Vcc node, a Vss node, and an interconnection node.
申请公布号 KR20000026342(A) 申请公布日期 2000.05.15
申请号 KR19980043849 申请日期 1998.10.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, YONG SU;JUNG, SUN MUN;JEONG, GYU CHEOL;KIM, HONG GYUN
分类号 H01L21/28;(IPC1-7):H01L21/28 主分类号 H01L21/28
代理机构 代理人
主权项
地址