| 摘要 |
PURPOSE: A device and a method for controlling Cryo pump in ion injection equipment is provided so that a compressor and the Cryo pump can be continuously operated by an auxiliary power supplied from the non-interruptible power supplier section by means of a main controller of the ion injection equipment. CONSTITUTION: A vacuum control device in an ion injection equipment used for manufacturing a semiconductor device comprises a vacuum controller (20) for performing a vacuum control function in general under the control of a main controller (10), which generates an operation control signal by detecting non-operation or mis-operation of the vacuum controller (20), a compressor (40) and a Cryo pump (50) for achieving a high vacuum state of a process chamber under the control of the vacuum controller, and a non-interruptible power supply section for supplying an auxiliary power by means of the compressor (40) and the Cryo pump (50) when the main power supply is interrupted. A method for vacuum control in an ion injection equipment comprises the steps of detecting non-operation or mis-operation of the vacuum controller (20), generating an operation control signal by the detection, keeping the compressor (40) and the Cryo pump (50) be operated by means of the operation control signal.
|
