发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To prevent transport failure in the processing of a heat developable photosensitive material particularly in an automatic processing machine, to suppress density changes after heat development in the case of long-term storage and to prevent a change in sensitivity and occurrence of fog independently of processing temperature. SOLUTION: In a heat developable photosensitive material having at least one image forming layer containing organic silver salt grains on the substrate and containing a reducing agent in a photographic constituent layer on the image forming layer side, at least one compound of the formula Rf-(A)n-Rf' [where each of Rf and Rf' is a group having at least one fluorine-containing aliphatic group, A is a group having at least one alkylene oxide group, and (n) is an integer of >=1. Rf and Rf' may be the same or different, but when Rf is CmF2m+1SO3-.NH3+, Rf and Rf' are the same. The symbol (m) stands for an integer of >=] is contained.
申请公布号 JP2000131795(A) 申请公布日期 2000.05.12
申请号 JP19980303996 申请日期 1998.10.26
申请人 KONICA CORP 发明人 SANPEI TAKESHI
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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