METHOD FOR EXAMINING DEFECT OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for examining defect of a semiconductor device is provided to eliminate noises when detecting the semiconductor device, by changing filter values in a process of detecting outer defect related to a mask pattern of the semiconductor device. CONSTITUTION: A method for examining defect of a semiconductor device compares pixels with neighboring patterns and detects defect which are not conformed. The defect examining method eliminates noises by making a gray level of a matrix array in a filter, which is used for finding out substantial defect. The gray level have over 70 in the middle and under 55 in the circumference.