| 摘要 |
PURPOSE: A bubble remover is provided to reduce defect of photoresist coating, thereby enhancing productivity. CONSTITUTION: A bubble remover comprises a tank(10) containing photoresist, an inlet line(22) and first valve(22a) for inducing the photoresist, a vacuum line(23) and second valve(23a), a gas inlet line(24) and third valve(24a), a photoresist outlet line(25) and forth valve(25a), a sensor(26) and a controller(27). The vacuum line and the second valve are mounted on the top of the tank and sustain the inside of the tank into vacuum state. The gas inlet line and the third valve are mounted on the top of the tank and inlet gas flows into the tank in order to make the inside of the tank into atmosphere state. The photoresist outlet line and the forth valve are mounted on the bottom of the tank and discharge the photoresist without bubbles. The sensor senses the inlet volume of the photoresist. The controller controls the opening and closing the respective valve.
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