发明名称 PRODUCTION OF LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To obtain a liquid crystal display panel which does not increase the occupancy area rate of additional capacitance and does not reduce the opening ratio of pixels even when the size of the capacitance is increased by using a material containing a tantalum-base metal oxide as the material of a dielectric film forming the capacitance. SOLUTION: An SiO2 underlayer 20 is deposited on a light transmissive glass substrate 14. Metal Ta is deposited and etched to form a desired gate wiring pattern. Anodic oxidation is carried out to form a Ta2O5 film 24 in such a way that the film fully covers the Ta gate wiring. The Ta2O5 film 24 acts as a gate insulating film on the Ta gate electrode 22 of a-Si TFT and acts as the dielectric film of additional capacitance on the Ta gate wiring 23. An ITO transparent electrode is then deposited and etched to form a pixel electrode 9. The additional capacitance comprises the Ta gate wiring 23, the Ta2O5 film 24 and the pixel electrode 9.</p>
申请公布号 JP2000131718(A) 申请公布日期 2000.05.12
申请号 JP19990266667 申请日期 1999.09.21
申请人 HITACHI LTD 发明人 TANAKA YASUO;TSUKADA TOSHIHISA;KANEKO YOSHIYUKI;YAMAMOTO HIDEAKI;MATSUMARU HARUO;TSUTSUI KEN
分类号 G09F9/30;G02F1/136;G02F1/1365;G02F1/1368;H01L21/205;H01L21/302;H01L21/3065;H01L21/3205;H01L21/336;H01L23/52;H01L29/786;(IPC1-7):G02F1/136;H01L21/306;H01L21/320 主分类号 G09F9/30
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