| 摘要 |
<p>PROBLEM TO BE SOLVED: To make formable a pixel pattern free from the generation of scratch by brush cleaning or the like, and improve the adhesibility to a substrate and a light shielding layer by incorporating a coloring agent, a specific alkali soluble resin, a polyfunctional monomer and a photopolymerization initiator. SOLUTION: The radiation sensitive composition for color filter containing the coloring agent, the alkali soluble resin containing a copolymer of a monomer expressed by a formula with other copolymerizable monomer, a polyfunctional monomer and the photopolymerization initiator is used. In the formula, each of R1-R3 is independently hydrogen atom or a 1-10C alkyl group and (n) is an integer of 1-5. In such a case, the radiation means one including visual ray, ultraviolet ray, far ultraviolet ray, electron beam, X-ray or the like. As the alkali soluble resin, other alkali soluble resin is used in combination with the copolymer. As the other alkali soluble resin, a resin, for example, containing an acidic functional group such as carboxyl group, phenolic hydroxide group is mentioned.</p> |
