发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE IMAGE FORMING MATERIAL |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having high sensitivity and excellent in solubility to a solvent. SOLUTION: The photopolymerizable composition contains an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiation system containing at least a titanocene compound as a radical activator and a compound having two carboxylic acid ester groups or carboxylic acid amide groups bonding to an aniline nitrogen atom by way of an alkylene chain.</p> |
申请公布号 |
JP2000131839(A) |
申请公布日期 |
2000.05.12 |
申请号 |
JP19980324730 |
申请日期 |
1998.11.16 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
HINO ETSUKO;NAGAO TAKUMI;URANO TOSHIYOSHI |
分类号 |
H01L21/027;C08F2/48;G03F7/004;G03F7/027;G03F7/028 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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