发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE IMAGE FORMING MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having high sensitivity and excellent in solubility to a solvent. SOLUTION: The photopolymerizable composition contains an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiation system containing at least a titanocene compound as a radical activator and a compound having two carboxylic acid ester groups or carboxylic acid amide groups bonding to an aniline nitrogen atom by way of an alkylene chain.</p>
申请公布号 JP2000131839(A) 申请公布日期 2000.05.12
申请号 JP19980324730 申请日期 1998.11.16
申请人 MITSUBISHI CHEMICALS CORP 发明人 HINO ETSUKO;NAGAO TAKUMI;URANO TOSHIYOSHI
分类号 H01L21/027;C08F2/48;G03F7/004;G03F7/027;G03F7/028 主分类号 H01L21/027
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