| 摘要 |
PROBLEM TO BE SOLVED: To provide the manufacturing equipment for a semiconductor device, which correctly supplies gas into a reaction chamber and wherein the erroneous operation of a flow-rate adjusting device is suppressed. SOLUTION: This manufacturing device has the following parts as the main constitutions: a gas-supply unit 101 for supplying raw-material gas, a liquid- material aerification unit 102 which aerificates liquid material, and a reaction chamber 1 for forming an oxide film and an ozone generator 2 which generates ozone that is one of the raw-material gas. The liquid-material aerification units are three kinds of the organic sources (liquid material). TEOS, TMPO and TMB are imparted to the carbureters, which are arranged in the vicinity of a reaction chamber 1 through the reapective liquid flow-rate adjustors 280, 281 and 282 in this constitution.
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