发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To prevent atmosphere in a substrate processing chamber from being leaked to the outside. SOLUTION: Pressure sensors 83a, 83b, 83c, and 83d for detecting an exhaust pressure are arranged in the middle of exhaust ducts 82a, 82b, 82c, and 82d. Also, both side brush washing part 50, second carrying chamber 42, surface brush washing part 60, and third carrying chamber 43 are communicated through input ports 84a, 84b, 84c, and 84d, air intake ducts 85a, 85b, 85c, and 85d, and air intake ports 86a, 86b, 86c, and 86d with a clean air space CL. A shutter mechanism 90 is provided related with the air intake ports 86a, 86b, 86c, and 86d, and when the exhaust pressure detected by any pressure sensors 83a, 83b, 83c, and 83d reaches a prescribed pressure value or less, the air intake ports 86a, 86b, 86c, and 86d can be closed by the shutter mechanism 90.
申请公布号 JP2000133627(A) 申请公布日期 2000.05.12
申请号 JP19980304406 申请日期 1998.10.26
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAWAMURA MASASHI;SAWADA ATSUSHI
分类号 B08B1/04;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B1/04
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