| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor for highly efficiently and quickly washing a substrate with a small amount of pure water. SOLUTION: A processing tank 20 for storing treated liquid such as pure water and for washing a substrate W is arranged inside an outer tank 10. The plural substrates W can be held by a lifter arm 42, and moved in a vertical direction between the inside part of the processing tank 10 and the upper part. When finishing washing treatment with pure water is ended in the processing tank 20, plural unidirectional pure water flows are formed at intervals equal to the array intervals at which the substrates W are held from an ejection nozzle 31 in a horizontal direction and a direction (Y-axial direction) in parallel with the main surface of the substrate W. Then, the substrate W is lifted from the processing tank 20 and allowed to pass through the pure water flow. That is, the main surface of the substrate W is scanned by the unidirectional pure water flow, and the absolute necessary pure water is supplied to the part which should be washed.
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