| 摘要 |
PROBLEM TO BE SOLVED: To readily detect and correct positional fluctuations of charged a particle beam by a method, wherein reference positions of charged particles are corrected based on stored information, in response to a step to be stored and a position of a stage. SOLUTION: Based on the actually measured value of a position of an alignment mark, regularity of arrangement in a pattern region on a wafer is decided (S115), and the wafer is moved continuously (S116). Next, based on a present stage position from a stage position detection part and a change quantity of a base line in each stage position stored in a memory (fluctuation amount of the reference position of electron beam), correction of the reference position of the electron beam at the present stage position is sought. Only the correction amount at the reference position of the electron beam is corrected by a deflector, so as to establish the relation of present reference base line by instructing an electronic optical system control part (S117).
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