| 摘要 |
PROBLEM TO BE SOLVED: To prevent a distance between adjacent stripes from increasing by a method, wherein correction is gradually made by a plurality of stripes after a drifting amount is detected in a step of correcting the drift amount. SOLUTION: An electron beam exposure system comprises drift amount detecting means for measuring a reference mark to detect the drift amount of electron beam, and drift amount correcting means. Even when the reference mark is measured during plotting a chip to detect a beam drift amount d1, correction is made gradually, ranging over a plurality of succeeding stripes as indicated byΔ. Furthermore, in a step of correcting a drift amount, from a time until detecting the drift amount next to calculation and an exposure time of each stripe, number of stripes N to be exposed until the next step of detecting the drift amount is calculated, and the difference between an expected drift amount and a present drift correction amount in a next step of detecting the drift amount is set as dx, and correction is made by each dx/N ranging over N pieces of the stripes.
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