发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a processor for improving throughput by shortening a time required for a drying process, which is the final stage of a series of processing, at the time of processing substrates one by one. SOLUTION: This substrate processor is provided with substrate holding and rotating means 12, 14, and 16 for holding a substrate in a horizontal attitude, and for rotating this substrate around a vertical shaft, and a treatment liquid supplying means 26 for supplying treatment liquid to the substrate held by the substrate holding and rotating means. Also, a gas jet port is arranged so as to be faced to the surface of a substrate W held by a spin chuck 12, a gas supplying unit 28 for supplying nitrogen gas through gas supplying piping 68 to the gas jet port is provided, and a heater 74 for heating the nitrogen gas is arranged so as to be inserted into the gas supply piping.
申请公布号 JP2000133630(A) 申请公布日期 2000.05.12
申请号 JP19980301950 申请日期 1998.10.23
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MURAOKA YUSUKE;HATANO HIROYUKI
分类号 B08B3/02;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
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